Dr. Ke Chuan, Research Assistant.
Research interest:Preparation and physical properties of thin films(Si:H、SiN、SiC、AlN and etc.) deposited By PECVD, and preparation and physical properties of first wall materials in fusion reactor. Main achievement and technological contribution: taking partin a number of projects supported by National High-Tech Research and National 973 Plan project. He delivered 2 Invited talks on academic conference and applied for 4 patents and 3 of which are authorized.